Tungsten Silicide
Tungsten Silicide
Tungsten silicide WSi2 Kei te whakamahia hei rauemi ru hiko i roto i te microelectronics, shunting i runga i waea polysilicon, paninga anti-hāoratanga me te paninga waea ātete.Ka whakamahia te tungsten silicide hei rauemi whakapā i roto i te microelectronics, me te parenga o te 60-80μΩcm.Ka hangaia ki te 1000°C.I te nuinga o te waa ka whakamahia hei shunt mo nga raina polysilicon hei whakanui ake i te kawe me te whakanui i te tere tohu.Ka taea te whakarite i te paparanga tungsten Silicide e te waipara kohu matū, penei i te waipara kohu.Whakamahia te monosilane, te dichlorosilane me te tungsten hexafluoride hei hau rawa.Ko te kiriata kua penapena he kore-stoichiometric me te whakapouri kia huri ki te ahua stoichiometric pai ake.
Ka taea e te tungsten silicide te whakakapi i te kiriata tungsten o mua.Ka whakamahia ano te tungsten silicide hei paparanga arai i waenga i te silicon me etahi atu konganuku.
He mea nui ano te Tungsten silicide i roto i nga punaha microelectromechanical, i roto i enei ko te tungsten silicide te nuinga ka whakamahia hei kiriata angiangi mo te hanga microcircuits.Mo tenei kaupapa, ko te kiriata tungsten silicide ka taea te plasma-etched ma te whakamahi, hei tauira, silicide.
| ITEM | Te hanganga matū | |||||
| Huānga | W | C | P | Fe | S | Si |
| Ihirangi(wt%) | 76.22 | 0.01 | 0.001 | 0.12 | 0.004 | Taurite |
Ko nga Taonga Taonga Motuhake he tohungatanga ki te Hanganga o te Sputtering Target a ka taea e ia te whakaputa Rawa Tungsten Silicide Sputtering i runga i nga whakaritenga a nga Kaihokohoko.Mo etahi atu korero, tena koa whakapiri mai ki a maatau.
